Liquid treatment apparatus and method
作者： Jiro Higashijima , Norihiro Itoh
DOI:
关键词: Composite material 、 Materials science 、 Rotation 、 Electronic engineering 、 Nozzle 、 Substrate (printing)
摘要: Disclosed is a liquid treatment apparatus for processing lower surface of the substrate. The includes first nozzle disposed below substrate retained by retaining unit to eject towards substrate, having plurality ejection ports, which are arrayed from position opposing central portion peripheral unit. An ejecting direction ejected port inclined rotation rotated rotational driving
lens.org 参考文章(20)
Paul A. Manfredi, Thomas J. Martin, Douglas P. Nadeau, Cuc Kim Huynh, Joseph M. Weatherwax, Wafer carrier rinsing mechanism ,(1999)
Yuji Kamikawa, Teruomi Minami, Norihiro Ito, Liquid processing apparatus, liquid processing method and storage medium ,(2012)
Hiroaki Takahashi, Substrate processing apparatus and substrate handling method ,(2007)
Mark Naoshi Kawaguchi, Mark Wilcoxson, David Mui, Method of particle contaminant removal ,(2009)
Joachim Pokorny, Andreas Steinrücke, Device and method for processing substrates ,(1999)
Hiroki Taniyama, Hironobu Nishi, Shigenori Kitahara, Yoshinori Kato, Takanori Miyazaki, Processing apparatus, processing system and processing method ,(2001)
Hiroshi Nagayasu, Yoshichika Tokuno, Substrate Processing Method, Storage Medium and Substrate Processing Apparatus ,(2007)
Mark G. Winkler, Thomas E. Winter, Bake plate lid cleaner and cleaning method ,(2007)
Toshi Yokoyama, Seiji Katsuoka, Kazuaki Maeda, Takahiro Ogawa, Kaoru Yamada, Substrate Cleaning Apparatus and Substrate Processing Unit ,(2005)