Substrate processing apparatus and substrate processing method drying substrate by spraying gas

摘要: A first gas nozzle and a second are fixedly provided in the vicinity of forward end arm. The arm is rotated along locus R while substrate rinsed with deionized water rotated, for discharging nitrogen from nozzles. Visible moisture loosely expelled upper surface by spraying nozzle, slightly remaining on fine pattern or like can also be completely removed to same region as that sprayed nozzle. Consequently, stably reliably dried. Thus, processing apparatus capable drying provided.