Gutter and splash-guard for protecting a wafer during transfer from a single wafer cleaning chamber

作者: Steven Verhaverbeke , Eugene Smargiassi , Brian H. Burrows , Ho-Man Rodney Chiu

DOI:

关键词:

摘要: A single wafer cleaning chamber that includes a rotatable bracket can place beneath an upper end of catch cup during process, gutter positioned above transfer slit; where the mate with to create gap, and at height equal or higher than gutter.

参考文章(20)
Anthony L. Adams, Darien Fenn, Multichannel drainage system ,(1974)
Kaoru Shinbara, Wafer holding mechanism ,(1987)
Kenya Ito, Mitsuhiko Shirakashi, Naoki Matsuda, Apparatus for cleaning a substrate such as a semiconductor wafer ,(2000)
Brian M. Bliven, Roy Winston Pascal, Bowl for processing semiconductor wafers ,(1999)
Greg Montanino, Bruce L. Hayes, Spin coating bowl ,(1998)
Hideya Tanaka, Minoru Kubota, Kenichi Miyamoto, Walter Swanson, Apparatus and method for washing substrate ,(1997)
Takeshi Tsukamoto, Mitsuhiro Sakai, Fumio Satou, Kiyomitsu Yamaguchi, Yoichi Honda, Method and apparatus for cleaning treatment ,(2000)
Shuichi Nagamine, Kazuo Sakamoto, Developing apparatus and method thereof ,(2000)