作者: Gerald Yin , Aihua Chen , Ryoji Todaka
DOI:
关键词: Engineering drawing 、 Process (engineering) 、 Engineering 、 Work (electrical) 、 Internal cavity 、 Semiconductor
摘要: A processing apparatus for semiconductor work pieces and related methodology is disclosed which includes a chamber having an internal cavity, has plurality of rotatable stations positioned therein wherein the each process piece.