作者: C. T. Black , K. W. Guarini , G. Breyta , M. C. Colburn , R. Ruiz
DOI: 10.1116/1.2366700
关键词: Hybrid silicon laser 、 Self-assembly 、 Semiconductor device fabrication 、 Fabrication 、 Materials science 、 Nanotechnology 、 Porous silicon 、 Polymer blend 、 Membrane 、 Silicon
摘要: A combination of diblock copolymer self-assembly and state-of-the-art semiconductor device fabrication methods is used to create highly uniform suspended porous silicon membranes. Integration these two processing techniques key realizing manufacturable high quality devices. Three different are shown for adjusting membrane pore dimensions between 10 35 nm, allowing optimization specific applications.