Threshold Selector With High Selectivity and Steep Slope for Cross-Point Memory Array

作者: Jeonghwan Song , Jiyong Woo , Amit Prakash , Daeseok Lee , Hyunsang Hwang

DOI: 10.1109/LED.2015.2430332

关键词: Programmable metallization cellHigh selectivityIonizationElectrolyteProtein filamentNanotechnologyThreshold voltageType (model theory)Materials scienceSteep slopeMolecular physics

摘要: In this letter, we demonstrated a new type of threshold selector with excellent electrical characteristics for cross-point memory array. The proposed Ag/TiO2-based device showed high selectivity ( $\sim 10^{\mathrm {\mathbf {7}}}$ ) and steep slope $ mV/decade). observed switching in programmable metallization cell occurred due to the spontaneous rupturing silver (Ag) filament. Ag ionization minimize steric repulsion between surrounding TiO2 electrolyte was main origin rupture.

参考文章(13)
U-In Chung, Myoung-Jae Lee, In-Kyeong Yoo, Seung Ryul Lee, Man Chang, Sungho Kim, Dongsoo Lee, Sae-Jin Kim, Chang Jung Kim, Eunju Cho, Young-Bae Kim, Kyung Min Kim, Performance of threshold switching in chalcogenide glass for 3D stackable selector symposium on vlsi technology. ,(2013)
K. Tsunoda, Y. Fukuzumi, J. R. Jameson, Z. Wang, P. B. Griffin, Y. Nishi, Bipolar resistive switching in polycrystalline TiO2 films Applied Physics Letters. ,vol. 90, pp. 113501- ,(2007) , 10.1063/1.2712777
Jan van den Hurk, Eike Linn, Hehe Zhang, Rainer Waser, Ilia Valov, Volatile resistance states in electrochemical metallization cells enabling non-destructive readout of complementary resistive switches Nanotechnology. ,vol. 25, pp. 425202- ,(2014) , 10.1088/0957-4484/25/42/425202
Ilia Valov, Rainer Waser, John R Jameson, Michael N Kozicki, Electrochemical metallization memories—fundamentals, applications, prospects Nanotechnology. ,vol. 22, pp. 254003- 254003 ,(2011) , 10.1088/0957-4484/22/25/254003
VSS Srinivasan, S Chopra, P Karkare, P Bafna, S Lashkare, P Kumbhare, Y Kim, S Srinivasan, S Kuppurao, S Lodha, Udayan Ganguly, None, Punchthrough-Diode-Based Bipolar RRAM Selector by Si Epitaxy IEEE Electron Device Letters. ,vol. 33, pp. 1396- 1398 ,(2012) , 10.1109/LED.2012.2209394
Daeseok Lee, Jaesung Park, Sangsu Park, Jiyong Woo, Kibong Moon, Euijun Cha, Sangheon Lee, Jeonghwan Song, Yunmo Koo, Hyunsang Hwang, BEOL compatible (300°C) TiN/TiO x /Ta/TiN 3D nanoscale (∼10nm) IMT selector international electron devices meeting. ,(2013) , 10.1109/IEDM.2013.6724604
Myoung-Jae Lee, Youngsoo Park, Bo-Soo Kang, Seung-Eon Ahn, Changbum Lee, Kihwan Kim, Wenxu Xianyu, G Stefanovich, Jung-Hyun Lee, Seok-Jae Chung, Yeon-Hee Kim, Chang-Soo Lee, Jong-Bong Park, In-Gyu Baek, In-Kyeong Yoo, None, 2-stack 1D-1R Cross-point Structure with Oxide Diodes as Switch Elements for High Density Resistance RAM Applications international electron devices meeting. pp. 771- 774 ,(2007) , 10.1109/IEDM.2007.4419061
Rainer Waser, Masakazu Aono, Nanoionics-based resistive switching memories Nature Materials. ,vol. 6, pp. 833- 840 ,(2007) , 10.1038/NMAT2023
Stefano Prada, Massimo Rosa, Livia Giordano, Cristiana Di Valentin, Gianfranco Pacchioni, Density functional theory study of TiO 2 /Ag interfaces and their role in memristor devices Physical Review B. ,vol. 83, pp. 245314- ,(2011) , 10.1103/PHYSREVB.83.245314
K. Virwani, G. W. Burr, R. S. Shenoy, C. T. Rettner, A. Padilla, T. Topuria, P. M. Rice, G. Ho, R. S. King, K. Nguyen, A. N. Bowers, M. Jurich, M. BrightSky, E. A. Joseph, A. J. Kellock, N. Arellano, B. N. Kurdi, K. Gopalakrishnan, Sub-30nm scaling and high-speed operation of fully-confined Access-Devices for 3D crosspoint memory based on mixed-ionic-electronic-conduction (MIEC) materials international electron devices meeting. ,(2012) , 10.1109/IEDM.2012.6478967