Fluid dispense methodology and apparatus for imprint lithography

摘要: A method of can be used to generating a fluid droplet pattern for an imprint lithography process. dispense head include set ports, wherein the ports are in fixed arrangement. The rotating rotation angle change pitch first direction; moving substrate and relative each other second direction substantially perpendicular dispensing droplets onto while other. formation electronic component within or over semiconductor substrate. apparatus configured carry out methods as described herein.