Lithographic system having diffraction grating and attenuated phase shifters

摘要: An ATOM lithographic mask includes a transparent substrate having pattern of attenuated phase shifters and diffraction grating aligned with the shifters. The form primary pattern, while diffracts exposure energy directed through to provide off axis illumination for chromeless formed using an additive or subtractive process. Both can be as simple line-space patterns in other required. In alternate embodiment is on separate mask.