Method and system for dual reticle image exposure

摘要: The present invention provides a method and system for simultaneously imaging at least two reticles onto substrate. According to the invention, wafer is passed through exposure sequence once with images from being exposed wafer. throughput of effectively maintained standard single pass level or twice that conventional systems. In one embodiment, produces reticle side-by-side in exit pupil optics step scan system. scanning action tool then superimposes during Each image exposes photoresist as scanned field synchronously reticles. synchronized so required are superimposed. another can be independently focused aligned.