Apparatus and method for profiling a beam
作者： Stuart T. Spence
DOI:
关键词: Beam parameter product 、 Beam divergence 、 Stereolithography 、 Laser beam quality 、 Optics 、 Materials science 、 Beam diameter 、 Photodetector
摘要: An apparatus and a method for profiling the intensity of beam thus measuring overall power are disclosed that have particular use in stereolithography. A sensor comprising pinhole plate photodetector behind measures portions as is moved over sensor. Software associated with sensors computer controls scanning mechanism so shifted to find move across it order develope profile. The invention can be used detect drift mechanism, determine focus beam, predict depth width photopolymer cured by beam.
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