Apparatus and method for calibrating and normalizing a stereolithographic apparatus

作者: Harry L. Tarnoff , Stuart T. Spence , Thomas A. Almquist , Warren Juran

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摘要: An apparatus and a method for calibrating normalizing stereolithographic so that reaction means directed by positioning supplied with information may be positioned accurately on designated surface of working medium. One or more sensors fixed in location respect to the medium are utilized correlate specific locations Other intermediate then determined technique linear interpolation.

参考文章(24)
Wesley D. Motooka, Optical scanner error compensator ,(1986)
Munz Otto John, Photo-glyph recording ,(1951)
Jack T. Dehait, Francis M. Talor, David C. Dietz, Milo S. Snyder, Calibrated optical micrometer ,(1977)
Robert E. Ansel, John J. Krajewski, Edward J. Murphy, Stereolithography using repeated exposures to increase strength and reduce distortion ,(1989)
Charles W. Hull, Apparatus for production of three-dimensional objects by stereolithography United States Patent, Appl., No. 638905, Filed. ,(1984)
Hideo Kodama, Automatic method for fabricating a three‐dimensional plastic model with photo‐hardening polymer Review of Scientific Instruments. ,vol. 52, pp. 1770- 1773 ,(1981) , 10.1063/1.1136492
P. J. Shayler, Laser beam distribution in the focal region. Applied Optics. ,vol. 17, pp. 2673- 2674 ,(1978) , 10.1364/AO.17.002673