Coating and developing apparatus, substrate processing method, and storage medium
作者： Yasushi Hayashida , Nobuaki Matsuoka , Shinichi Hayashi
DOI:
关键词: Process (computing) 、 Engineering 、 Optoelectronics 、 Transfer (computing) 、 Substrate (printing) 、 Processing methods 、 Transfer mechanism 、 Coating 、 Engineering drawing 、 Block (telecommunications)
摘要: A coating and developing apparatus is provided which requires a smaller occupation space even when it incorporates substrate inspection unit, while eliminating disadvantageous layout. film forming part B 3 including plurality of process units transfer mechanisms 4 , 1 31 mechanism are vertically arranged in block S 2 . There disposed the on side carrier TRS for transferring W between same respective parts, movable D unit these units. At least one includes 43 inspecting transferred by corresponding part.
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