作者: Felix Braun , Lukas Eng , Sven Trogisch , Brigitte Voit
关键词: Methacrylamide 、 Covalent bond 、 Amine gas treating 、 Copolymer 、 Chemistry 、 Nitro 、 Protecting group 、 Radical polymerization 、 Monomer 、 Polymer chemistry
摘要: Photolabile terpolymers have been designed and used to prepare thin organic films covalently attached glass silicon substrates. For this, containing photolabile protected amine functions introduced by N-(N-nitroveratryloxycarbonylaminopropyl)methacrylamide as well (trimethoxysilyl)propylmethacrylate MMA comonomers synthesized via free radical polymerization. The nitro group protecting leads a retardation of the But complete removal non-reacted monomer from reaction product without gelation anchoring groups was achieved. these were structured imagewise UV laser light irradiation in order create defined functional areas at template surface ready for further modification attachment nanoobjects. selective deprotection verified UV-imaging using fluorescence labeling.