Material science and device physics in SiC technology for high-voltage power devices

作者: Tsunenobu Kimoto

DOI: 10.7567/JJAP.54.040103

关键词: Semiconductor devicePower MOSFETEngineering physicsSilicon carbidePhysicsElectronicsTransistorReliability (semiconductor)DiodePower semiconductor device

摘要: … Schottky barrier diodes (SBDs) and power metal–oxide–semiconductor field-effect … reliability of SiC devices is still poor. In this review paper, the features and present status of SiC power …

参考文章(292)
A. Agarwal, S.-H. Ryu, J. Palmour, Power MOSFETs in 4H-SiC: Device Design and Technology Silicon Carbide. pp. 785- 811 ,(2004) , 10.1007/978-3-642-18870-1_33
M. Laube, F. Schmid, K. Semmelroth, G. Pensl, R. P. Devaty, W. J. Choyke, G. Wagner, M. Maier, Phosphorus-Related Centers in SiC Silicon Carbide. pp. 493- 515 ,(2004) , 10.1007/978-3-642-18870-1_20
W. J. Choyke, R. P. Devaty, Optical Properties of SiC: 1997–2002 Silicon Carbide. pp. 413- 435 ,(2004) , 10.1007/978-3-642-18870-1_17
S. Tanimoto, H. Okushi, K. Arai, Ohmic Contacts for Power Devices on SiC Silicon Carbide. pp. 651- 669 ,(2004) , 10.1007/978-3-642-18870-1_27
Hui-feng Li, Sima Dimitrijev, H. Barry Harrison, Denis Sweatman, INTERFACIAL CHARACTERISTICS OF N2O AND NO NITRIDED SIO2 GROWN ON SIC BY RAPID THERMAL PROCESSING Applied Physics Letters. ,vol. 70, pp. 2028- 2030 ,(1997) , 10.1063/1.118773
G. Pensl, 弘之 松波, W. J. Choyke, Silicon carbide : recent major advances Springer. ,(2004)