A comparison of Si CMOS, SiGe BiCMOS, and InP HBT technologies for high-speed and millimeter-wave ICs

作者: S.P. Voinigescu , T.O. Dickson , R. Beerkens , I. Khalid , P. Westgaard

DOI: 10.1109/SMIC.2004.1398180

关键词: MOSFETBroadbandIntegrated injection logicIntegrated circuitHeterojunction bipolar transistorExtremely high frequencyOptoelectronicsMaterials scienceCMOSBiCMOS

摘要: … simultaneous fT and fMAX values exceeding 150 GHz. At the … , the optimum FMIN bias, approximately 0.13 mA/µm, is close … the 130-nm SiGe BiCMOS technology node, designers can …

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