Simulation of SiH 4 and N 2 O PECVD process for preparing SiO 2 thin film
作者： Zhuwen Zhou , Yiyan Yang , Bo Kong , Chen Lu
DOI: 10.1109/PIERS.2017.8262155
关键词: Chemical reaction 、 Plasma-enhanced chemical vapor deposition 、 Chemical engineering 、 Ionization 、 Materials science 、 Kinetic energy 、 Silane 、 Thin film 、 Chemical vapor deposition 、 Plasma
摘要: Through the particle in cell simulation (PIC), we successfully simulated silane (SiH 4 ) and nitrous oxide (N 2 O) plasma enhanced chemical vapor deposition (PECVD) process for preparing SiO thin film. The of experiment was analyzed, which were kinetic energy, sheath space energy distribution ions ionization. Analysis these physical parameters, a comparison SiH N O reaction experiments, results from perspectives can explain reasonably film, through theory interpret use (N2 forming mechanism generation SiO2
sci-hub.se 参考文章(6)
Zhang Hong-Wei, Chen Gai-Rong, Zhang Li-Wei, Lu Jing-Xiao, Wen Shu-Tang, SiH 4 /H 2 等离子体气相生长硅薄膜的动力学模型 Acta Physica Sinica. ,vol. 59, pp. 4901- 4910 ,(2010) , 10.7498/APS.59.4901
Jeong Woo Lee, Sang Sub Kim, Byung-Taek Lee, Jong Ha Moon, Ge-doped SiO2 glass films prepared by plasma enhanced chemical vapor deposition for planar waveguides Applied Surface Science. ,vol. 228, pp. 271- 276 ,(2004) , 10.1016/J.APSUSC.2004.01.013
M. Gharghi, S. Sivoththaman, Graded silicon based PECVD thin film for photovoltaic applications Proceedings of SPIE. ,vol. 6674, ,(2007) , 10.1117/12.735091
Xianzhi Fu, Louis A. Clark, Qing Yang, Marc A. Anderson, Enhanced Photocatalytic Performance of Titania-Based Binary Metal Oxides: TiO2/SiO2 and TiO2/ZrO2 Environmental Science & Technology. ,vol. 30, pp. 647- 653 ,(1996) , 10.1021/ES950391V
Zhuwen Zhou, Rongfeng Linghu, Mingsen Deng, Deyong Xiong, An analytical model of computing ion energy distributions for multiple frequencies capacitive discharges Journal of Applied Physics. ,vol. 112, pp. 063306- ,(2012) , 10.1063/1.4754447
Kh. S. Martirosyan, A. S. Hovhannisyan, V. M. Aroutiounian, Calculation of reflectance of porous silicon double‐layer antireflection coating for silicon solar cells Physica Status Solidi (c). ,vol. 4, pp. 2103- 2106 ,(2007) , 10.1002/PSSC.200674391