Dry etching apparatus and method for manufacturing touch screen panels using the same
作者： Bong-Sub Song , Soung-Chang Ku
DOI:
关键词: Electrode 、 Shadow mask 、 Substrate (printing) 、 Electrical engineering 、 Port (circuit theory) 、 Reactive gas 、 Dry etching 、 Materials science 、 Optoelectronics 、 Injection port
摘要: A dry etching apparatus for performing in manufacture of a set touch screen panels on mother substrate, including chamber, an upper electrode the chamber at portion thereof, configured to apply high-frequency power source (RF) interior lower gas injection port inject compound mixture into exhaust reactive produced and shadow mask disposed above location substrate panels, having plurality exposure windows respectively corresponding portions be formed.
lens.org 参考文章(5)
Kunal N. Taravade, Gregory A. Johnson, Charles W. Jurgensen, Confinement device for use in dry etching of substrate surface and method of dry etching a wafer surface ,(2001)
Peter Cirigliano, Ji Soo Kim, Dongho Heo, Sangheon Lee, Daehan Choi, S.M. Reza Sadjadi, Infinitely selective photoresist mask etch ,(2006)
Mukund Srinivasan, Jian J. Chen, Eric H. Lenz, Chamber configuration for confining a plasma ,(2001)
Yuko Fukawa, Yosuke Inomata, Dry etching apparatus, dry etching method, and cleaning method adopted in dry etching apparatus ,(2003)