作者: Feng Qiu , Jinzhong Xiang , Jincheng Kong , Lianjie Yu , Lingde Kong
DOI: 10.1088/1674-4926/32/3/033004
关键词: Photoconductivity 、 Sputter deposition 、 Amorphous solid 、 Analytical chemistry 、 Atmospheric temperature range 、 Substrate (electronics) 、 Crystallite 、 Carbon film 、 Materials science 、 Thin film
摘要: This paper reports the dark conductivity and photoconductivity of amorphous Hg0.78Cd0.22Te thin films deposited on an Al2O3 substrate by RF magnetron sputtering. It is determined that conduction activation energy 0.417 eV for as-grown sample. Thermal quenching absent sample during testing temperature zone, but reverse true polycrystalline Photosensitivity shows maximum at 240 K films, while it higher than in range from 170 to 300 K. The recombination mechanism monomolecular process room temperature, which different low range. μτ-product 10−11−10−9cm2/V, indicates some defect states exist films.