CHAMBER MEMEBER OF A PLASMA SOURCE AND PEDESTAL WITH RADIALLY OUTWARD POSITIONED LIFT PINS FOR TRANSLATION OF A SUBSTRATE C-RING
作者： Caron James Eugene , Angelov Ivelin , Park Joon Hong , Treadwell Jason Lee , Lai Canfeng
DOI:
关键词: Plasma 、 Optics 、 Pedestal 、 Materials science 、 Lift (force) 、 Injector 、 Inner diameter
摘要: A chamber member of a plasma source is provided and includes sidewall, transition member, top wall an injector connecting member. The sidewall cylindrically-shaped surrounds upper region substrate processing chamber. connected to the sidewall. wall, positioned vertically higher than configured connect gas injector. Gas passes through via into center height low inner diameter ratio 0.25-0.5 and/or outer 0.4-0.85.
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