作者: Dhinesh Babu Velusamy , Richard Hahnkee Kim , Kazuto Takaishi , Tsuyoshi Muto , Daisuke Hashizume
DOI: 10.1016/J.ORGEL.2014.07.035
关键词: Optoelectronics 、 AND gate 、 Ferroelectricity 、 Graphene 、 Insulator (electricity) 、 Electrode 、 Ferroelectric capacitor 、 Materials science 、 Field-effect transistor 、 Electrical conductor
摘要: Abstract Polymer ferroelectric-gate field effect transistors (Fe-FETs) employing ferroelectric polymer thin films as gate insulators are highly attractive a next-generation non-volatile memory. For minimizing leakage current of device which arises from electrically defective layer in particular at low operation voltage, the materials design interlayers between insulator and electrode is essential. Here, we introduce new solution-processed interlayer conductive reduced graphene oxides (rGOs) modified with conjugated block copolymer, poly(styrene- -paraphenylene) (PS- b -PPP). A FeFET p-type oligomeric semiconducting channel poly(vinylidene fluoride-co-trifluoroethylene) (PVDF-TrFE) exhibited characteristic source–drain hysteresis arising polarization switching PVDF-TrFE insulator. Our PS- -PPP rGOs (PMrGOs) moieties embedded insulating matrix not only significantly but also efficiently lowered voltage device. In consequence, showed large memory window high ON/OFF ratio excellent data retention read/write cycle endurance. Furthermore, our PMrGOs were successfully employed to FeFETs fabricated on mechanically flexible substrates promising performance under repetitive bending deformation.