Studies of coherent and diffuse x‐ray scattering by porous silicon
作者： Daniel Bellet , Gérard Dolino , Mireille Ligeon , Pierre Blanc , Michäel Krisch
DOI: 10.1063/1.350727
关键词: Porous silicon 、 Microstructure 、 Diffractometer 、 Optics 、 Porous medium 、 X-ray crystallography 、 Diffraction 、 Molecular physics 、 Scattering 、 Materials science 、 Silicon
摘要: The microstructure of porous silicon layers has been studied by means x‐ray diffraction. Using a double‐crystal diffractometer, the observed diffraction patterns give directly mismatch between lattice parameters and substrate, curvature various samples obtained in different conditions. From measurements with same experimental set‐up, but larger scan range, broad diffuse bumps produced pore structure have observed. This new feature allows us to obtain structural informations on nondestructive way. In particular, we anisotropic pattern showing preferential elongation pores perpendicular (100) surface.
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V. A. Labunov, V. P. Bondarenko, V. E. Borisenko, A. M. Dorofeev, High‐Temperature Treatment of Porous Silicon Physica Status Solidi (a). ,vol. 102, pp. 193- 198 ,(1987) , 10.1002/PSSA.2211020119
K. Barla, G. Bomchil, R. Herino, J.C. Pfister, J. Baruchel, X-ray topographic characterization of porous silicon layers Journal of Crystal Growth. ,vol. 68, pp. 721- 726 ,(1984) , 10.1016/0022-0248(84)90110-6
S.‐F. Chuang, S. D. Collins, R. L. Smith, Porous silicon microstructure as studied by transmission electron microscopy Applied Physics Letters. ,vol. 55, pp. 1540- 1542 ,(1989) , 10.1063/1.102239
M. J. J. Theunissen, Etch Channel Formation during Anodic Dissolution of N‐Type Silicon in Aqueous Hydrofluoric Acid Journal of The Electrochemical Society. ,vol. 119, pp. 351- 360 ,(1972) , 10.1149/1.2404201
M. I. J. Beale, N. G. Chew, M. J. Uren, A. G. Cullis, J. D. Benjamin, Microstructure and formation mechanism of porous silicon Applied Physics Letters. ,vol. 46, pp. 86- 88 ,(1985) , 10.1063/1.95807
I. M. Young, M. I. J. Beale, J. D. Benjamin, X‐ray double crystal diffraction study of porous silicon Applied Physics Letters. ,vol. 46, pp. 1133- 1135 ,(1985) , 10.1063/1.95733
R. Herino, G. Bomchil, K. Barla, C. Bertrand, J. L. Ginoux, Porosity and Pore Size Distributions of Porous Silicon Layers Journal of The Electrochemical Society. ,vol. 134, pp. 1994- 2000 ,(1987) , 10.1149/1.2100805
Bennett C. Larson, F. W. Young, A. Comparison of Diffuse Scattering by Defects Measured in Anomalous Transmission and Near Bragg Reflections Zeitschrift für Naturforschung A. ,vol. 28, pp. 626- 632 ,(1973) , 10.1515/ZNA-1973-0513
P. Goudeau, A. Naudon, G. Bomchil, R. Herino, X‐ray small‐angle scattering analysis of porous silicon layers Journal of Applied Physics. ,vol. 66, pp. 625- 628 ,(1989) , 10.1063/1.343528
A. Bensaid, G. Patrat, M. Brunel, F. de Bergevin, R. Hérino, Characterization of porous silicon layers by grazing- incidence X-ray fluorescence and diffraction Solid State Communications. ,vol. 79, pp. 923- 928 ,(1991) , 10.1016/0038-1098(91)90444-Z