Measurement of deposition rate and ion energy distribution in a pulsed dc magnetron sputtering system using a retarding field analyzer with embedded quartz crystal microbalance.
作者： Shailesh Sharma , David Gahan , Paul Scullin , James Doyle , Jj Lennon
DOI: 10.1063/1.4946788
关键词: Radio frequency 、 Crystal 、 Quartz crystal microbalance 、 Materials science 、 Optoelectronics 、 Thin film 、 Deposition (phase transition) 、 Sputtering 、 Pulsed DC 、 Sputter deposition
摘要: A compact retarding field analyzer with embedded quartz crystal microbalance has been developed to measure deposition rate, ionized flux fraction, and ion energy distribution arriving at the substrate location. The sensor can be placed on grounded, electrically floating, or radio frequency (rf) biased electrodes. calibration method is presented compensate for temperature effects in crystal. metal ionization of ions location are investigated an asymmetric bipolar pulsed dc magnetron sputtering reactor under rf conditions. diagnostic this research work does not suffer from complications caused by water cooling arrangements maintain constant attractive technique characterizing a thin film system.
scitation.org
harvard.edu
sci-hub.se 参考文章(23)
SM Rossnagel, J Hopwood, Metal ion deposition from ionized mangetron sputtering discharge Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. ,vol. 12, pp. 449- 453 ,(1994) , 10.1116/1.587142
T. G. Snodgrass, J. H. Booske, W. Wang, A. E. Wendt, J. L. Shohet, Gridless ionized metal flux fraction measurement tool for use in ionized physical vapor deposition studies Review of Scientific Instruments. ,vol. 70, pp. 1525- 1529 ,(1999) , 10.1063/1.1149618
P Poolcharuansin, M Bowes, T J Petty, J W Bradley, Ionized metal flux fraction measurements in HiPIMS discharges Journal of Physics D. ,vol. 45, pp. 322001- ,(2012) , 10.1088/0022-3727/45/32/322001
D. B. Hayden, D. R. Juliano, K. M. Green, D. N. Ruzic, C. A. Weiss, K. A. Ashtiani, T. J. Licata, Characterization of magnetron-sputtered partially ionized aluminum deposition Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. ,vol. 16, pp. 624- 627 ,(1998) , 10.1116/1.581078
S. M. Rossnagel, J. Hopwood, Magnetron sputter deposition with high levels of metal ionization Applied Physics Letters. ,vol. 63, pp. 3285- 3287 ,(1993) , 10.1063/1.110176
S. Schiller, K. Goedicke, J. Reschke, V. Kirchhoff, S. Schneider, F. Milde, Pulsed magnetron sputter technology Surface and Coatings Technology. ,vol. 61, pp. 331- 337 ,(1993) , 10.1016/0257-8972(93)90248-M
Liang Meng, Ramasamy Raju, Randolph Flauta, Hyungjoo Shin, David N. Ruzic, Douglas B. Hayden, In situ plasma diagnostics study of a commercial high-power hollow cathode magnetron deposition tool Journal of Vacuum Science and Technology. ,vol. 28, pp. 112- 118 ,(2010) , 10.1116/1.3271132
WD Sproul, High-rate reactive DC magnetron sputtering of oxide and nitride superlattice coatings Vacuum. ,vol. 51, pp. 641- 646 ,(1998) , 10.1016/S0042-207X(98)00265-6
D. Gahan, B. Dolinaj, M. B. Hopkins, Retarding field analyzer for ion energy distribution measurements at a radio-frequency biased electrode Review of Scientific Instruments. ,vol. 79, pp. 033502- ,(2008) , 10.1063/1.2890100
K. M. Green, D. B. Hayden, D. R. Juliano, D. N. Ruzic, Determination of flux ionization fraction using a quartz crystal microbalance and a gridded energy analyzer in an ionized magnetron sputtering system Review of Scientific Instruments. ,vol. 68, pp. 4555- 4560 ,(1997) , 10.1063/1.1148430