Video analysis of inclusion induced macroparticle emission from aluminum sputtering targets
作者： C. E. Wickersham , J. E. Poole , J. S. Fan , L. Zhu
DOI: 10.1116/1.1403718
关键词: Analytical chemistry 、 Inclusion (mineral) 、 Charge coupled device camera 、 Aluminum oxide 、 Sputtering 、 Atomic physics 、 Molten metal 、 Electric arc 、 Doping 、 Aluminium 、 Materials science
摘要: Molten metal macroparticles emitted from the surface of aluminum sputtering targets during arcing events is an important source particulate contamination in sputtering. We used high-speed video analysis purposefully doped with oxide inclusions to determine velocity, trajectory, and relative size macroparticles. The results these analyses show that molten droplets are target velocities ranging 5 over 500 m/s. Ejection angles for observed were concentrated at around 30° plane. also found only certain generated detectable macroparticle emission (∼18% arc events). Macroparticle velocity did not appear be related. An estimate temperature based upon sensitivity charge coupled device camera lack cooling yields b...
scitation.org
harvard.edu
aip.org
sci-hub.se 参考文章(30)
John E. Robinson, B.S. Yarlagadda, R.A. Sacks, Models for chunk sputtering Journal of Nuclear Materials. ,vol. 63, pp. 432- 437 ,(1976) , 10.1016/0022-3115(76)90361-5
Gary S. Selwyn, J. S. McKillop, Kurt L. Haller, J. J. Wu, In situ plasma contamination measurements by HeNe laser light scattering: A case study Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. ,vol. 8, pp. 1726- 1731 ,(1990) , 10.1116/1.576838
C. G. Suits, J. P. Hocker, Role of Oxidation in Arc Cathodes Physical Review. ,vol. 53, pp. 670- 670 ,(1938) , 10.1103/PHYSREV.53.670
E. P. EerNisse, S. T. Picraux, Role of integrated lateral stress in surface deformation of He‐implanted surfaces Journal of Applied Physics. ,vol. 48, pp. 9- 17 ,(1977) , 10.1063/1.323332
Eoin W. Gray, Julian R. Pharney, Electrode erosion by particle ejection in low‐current arcs Journal of Applied Physics. ,vol. 45, pp. 667- 671 ,(1974) , 10.1063/1.1663300
G. S. Selwyn, J. Singh, R. S. Bennett, In situ laser diagnostic studies of plasma‐generated particulate contamination Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. ,vol. 7, pp. 2758- 2765 ,(1989) , 10.1116/1.576175
J. Goree, T. E. Sheridan, Particulate release from surfaces exposed to a plasma Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. ,vol. 10, pp. 3540- 3544 ,(1992) , 10.1116/1.577781
P.C.L. Pfeil, L.B. Griffiths, THE EFFECT OF INCLUSIONS ON THE ARCING BEHAVIOUR OF METALS Journal of Nuclear Materials. ,vol. 1, pp. 244- 248 ,(1959) , 10.1016/0022-3115(59)90020-0
A. E. Guile, B. Juttner, Basic Erosion Processes of Oxidized and Clean Metal Cathodes by Electric Arcs IEEE Transactions on Plasma Science. ,vol. 8, pp. 259- 269 ,(1980) , 10.1109/TPS.1980.4317315
Vikram Pavate, Murali Abburi, Sunny Chiang, Keith Hansen, Glen Mori, Murali K. Narasimhan, Sesh Ramaswami, Jaim Nulman, Daryl Restaino, Correlation between aluminum alloy sputtering target metallurgical characteristics, arc initiation, and in-film defect intensity Multilevel interconnect technology. Conference. ,vol. 3214, pp. 42- 47 ,(1997) , 10.1117/12.284663