作者: A. Lenz , E. Tournié , J. Schuppang , M. Dähne , H. Eisele
DOI: 10.1063/1.4795020
关键词: Deposition (law) 、 Gallium arsenide 、 Nanotechnology 、 Optoelectronics 、 Nanolithography 、 Stoichiometry 、 Nanostructure 、 Scanning tunneling microscope 、 Nanoparticle 、 Materials science 、 Monolayer
摘要: Buried GaAs depositions in a GaSb(001) matrix with few monolayers (ML) thickness form nanometer size tensile-strained agglomerations. Cross-sectional scanning tunneling microscopy reveals case of 1 ML and 2 ML lateral sizes about 5–6 nm heights 6–8 ML, while the 3 ML 4 ML deposition increase to 9–11 nm 8–11 ML. The stoichiometry nanostructures is intermixed GaSb material, particularly for low amounts deposited GaAs. This investigation exhibits defect free growth GaAs/GaSb(001) demonstrates promising perspectives future developments Ga(In)As/GaSb(001) system.