Method for producing film-forming composition, film- forming composition, method for forming film and silica- based film
作者： Masahiro Akiyama , Koichi Hasegawa , Kinji Yamada , Mutsuhiko Yoshioka , Eiji Hayashi
DOI:
关键词: Composition (visual arts) 、 Hydrolysis 、 Catalysis 、 Materials science 、 Relative permittivity 、 Chromatography 、 Chemical engineering 、 Component (thermodynamics) 、 Mixing (process engineering) 、 Semiconductor 、 Radius
摘要: PROBLEM TO BE SOLVED: To provide a film-forming composition capable of forming silica- based film having high crack resistance the coated and small baking temperature dependence relative dielectric constant as an interlaminar insulation material in semiconductor element, etc. SOLUTION: This method for producing comprises mixing (A) at least one kind hydrolysis condensate obtained by hydrolyzing condensing alkoxysilane compound presence water catalyst 10-30 nm average inertial radius with (B) different >=3 from component A.
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