Reaction system for growing a thin film
作者： Eric Shero , Carl White , Min Yan , Marko Peussa , Darko Babic
DOI:
关键词: Analytical chemistry 、 Inlet 、 Deposition (phase transition) 、 Deposition chamber 、 Optoelectronics 、 Wafer 、 Thin film 、 Reaction system 、 Chemistry
摘要: An atomic deposition (ALD) thin film apparatus includes a chamber configured to deposit on wafer mounted within space defined therein. The comprises gas inlet that is in communication with the space. A system deliver of chamber. At least portion positioned above mixer mix plurality streams. transfer member fluid and inlet. comprising pair horizontally divergent walls spread horizontal direction before entering
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