Multiple inlet atomic layer deposition reactor
作者： Jeong-Ho Lee , Dae-Youn Kim , Yong-Min Yoo
DOI:
关键词:
摘要: A reactor configured to subject a substrate alternately repeated surface reactions of vapor-phase reactants is disclosed. The includes reaction chamber, plurality inlets, and an exhaust outlet. chamber space. also gas flow control guide structure within the chamber. resides over space interposed between inlets channels, each channels extends from one upstream periphery Each progressively widens as channel inlet further holder in
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