Gas distribution apparatus for semiconductor processing

摘要: A gas distribution system for uniformly or non-uniformly distributing across the surface of a semiconductor substrate. The includes support plate and showerhead which are secured together to define chamber therebetween. baffle assembly including one more plates is located within chamber. arrangement first supply supplying process central portion second peripheral region Because pressure greater at locations closer outlets supplies, backside can be made uniform than in case with single supply. In arrangement, supplies open into plenum between top temperature controlled member wherein divided regions by an O-ring. opens above upper periphery lower plate.