Reaction chamber component having improved temperature uniformity
作者： Fangli Hao , Javad Pourhashemi , Rajinder Dhindsa
DOI:
关键词:
摘要: A component useful for a plasma reaction chamber includes heat sink such as temperature-controlled support member and heated an electrically powered showerhead electrode. The electrode is peripherally secured to the enclose gas distribution between top surface of bottom member. transfer extends transfers from area temperature buildup on in order control across
google.nl 参考文章(22)
Hayashi Ootuki, Method for treating surface of aluminum material and plasma treating apparatus ,(1995)
Richard A. Ruthers, Ronald D. Argent, Roy A. Webber, Electrode blocks and block assemblies ,(1990)
David J. Drage, Plasma reactor having slotted manifold ,(1984)
Ivo A. Miller, Eric H. Lenz, Robert A. Frazier, Michael L. Calvisi, Electrode clamping assembly and method for assembly and use thereof ,(1996)
David J. Drage, Mark M. Stark, Douglas H. Warenback, Non-uniform gas inlet for dry etching apparatus ,(1987)
Robert Steger, Gregory Shmunis, James Taoka, Apparatus and method for transferring heat from a hot electrostatic chuck to an underlying cold body ,(1996)
David H. Tracy, Donald L. Smith, Electrode for plasma etching system ,(1985)
Lee Chen, Stanley J. Poloncic, Charles J. Hendricks, Gangadhara S. Mathad, Single wafer plasma etch reactor ,(1984)
Shigeki Tozawa, Shunichi Iimuro, Yoshikazu Ito, Hiromitsu Matsuo, Akira Nozawa, Kazushi Tomita, Motohiro Hirano, Yutaka Miura, Plasma etching system and plasma etching method ,(1995)
Junzou Azuma, Toru Otsubo, Ichirou Sasaki, Mitsuo Tokuda, Yasuhiro Yamaguchi, Processing apparatus and method for plasma processing ,(1990)