Method and apparatus for providing uniform gas delivery to substrates in CVD and PECVD processes
作者： Scott William Dunham
DOI:
关键词: Optoelectronics 、 Communication channel 、 Electrical engineering 、 Gas supply 、 Diffusion (business) 、 Diffuser (thermodynamics) 、 Plasma-enhanced chemical vapor deposition 、 Materials science
摘要: Showerhead diffuser (9) has a first channel region (11) having plural independent radially-concentric channels (23) and individual gas supply ports (17) from side to one of the (23), second (15) (27) pattern diffusion passages (31) side, transition (13) between at least passage (25) for communicating each in corresponding region. The showerhead is mounted chamber such that faces away reactor opens into chamber. Supply (17), (25), do not align, there special plasma-quenching ring (29) channels.
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