Clean transfer method and system therefor
作者： Toshihiko Miyajima , Eisaku Miyauchi , Tetsuo Takahashi
DOI:
关键词: Semiconductor 、 Electrical engineering 、 Mechanical engineering 、 Degree (temperature) 、 Engineering 、 Vacuum chamber 、 Torr 、 Transfer (computing)
摘要: A clean transfer method capable of safely transferring a semiconductor or the like to various apparatus for treating while keeping environment clean. In method, is transferred between vacuum box arranged in room and kept at degree 1 Torr less chamber maintenance ports are air-tightly connected each other. The movably arranged.
lens.org 参考文章(9)
Michel Reboul, Charles Glachet, Connector device for two reactor containments ,(1988)
Andrew William O'sullivan, George Allan Maney, W. George Faraco, Sealed standard interface apparatus. ,(1985)
Mihir Parikh, Anthony Charles Bonora, Sealable transportable container having a particle filtering system ,(1986)
Susumu Aiuchi, Hideki Tateishi, Katsuhiro Iwashita, Hiroshi Nakamura, Tamotsu Shimizu, Continuous sputtering apparatus ,(1984)
Francois Conche, Procedure for transferring objects without breaking confinement ,(1985)
Yasuo Munakata, Mineo Gotou, Vacuum device for handling workpieces ,(1988)
David Lawrence Thrasher, Barclay J. Tullis, Mark E. Johnston, Mihir Parikh, System for integrated circuit processing ,(1984)
Osamu Kamiya, Kyosuke Ogawa, Takashi Kurokawa, Yasutomo Fujiyama, Vacuum processing apparatus for chemical vapour deposition ,(1985)
Ino Youichi, Kosuge Kazuo, SUBSTANCE TRANSFER APPARATUS BETWEEN VACUUM SYSTEM AND ATMOSPHERIC PRESSURE PART ,(1985)