Computationally efficient analytic charge model for III-V cylindrical nanowire transistors

作者: Mohit D. Ganeriwala , Enrique G. Marin , Francisco G. Ruiz , Nihar R. Mohapatra

DOI: 10.1109/ULIS.2018.8354767

关键词: AND gateCapacitanceComputational physicsSolverSemiconductor device modelingSchrödinger equationPhysicsTransistorLogic gateNanowire

摘要: In this paper, we present a computationally efficient compact model for calculating the charges and gate capacitance of III-V cylindrical nanowire transistors. We proposed an approximation which decouples Poisson Schrodinger equation addresses issues developing analytical model. Using approximation, derived suitable circuit simulators. The is physics based does not include any empirical parameters. accuracy verified across nanowires different sizes materials using simulation results from 2D Poisson-Schrodinger solver.

参考文章(11)
Katsuhiro Tomioka, Masatoshi Yoshimura, Takashi Fukui, A III–V nanowire channel on silicon for high-performance vertical transistors Nature. ,vol. 488, pp. 189- 192 ,(2012) , 10.1038/NATURE11293
Jesús A. del Alamo, Nanometre-scale electronics with III–V compound semiconductors Nature. ,vol. 479, pp. 317- 323 ,(2011) , 10.1038/NATURE10677
J. Robertson, B. Falabretti, Band offsets of high K gate oxides on III-V semiconductors Journal of Applied Physics. ,vol. 100, pp. 014111- ,(2006) , 10.1063/1.2213170
EG Marin, FG Ruiz, IM Tienda-Luna, A Godoy, P Sánchez-Moreno, F Gámiz, None, Analytic potential and charge model for III-V surrounding gate metal-oxide-semiconductor field-effect transistors Journal of Applied Physics. ,vol. 112, pp. 084512- ,(2012) , 10.1063/1.4759275
Jiseok Kim, Massimo V. Fischetti, Electronic band structure calculations for biaxially strained Si, Ge, and III-V semiconductors Journal of Applied Physics. ,vol. 108, pp. 013710- ,(2010) , 10.1063/1.3437655
M. V. Fischetti, L. Wang, B. Yu, C. Sachs, P. M. Asbeck, Y. Taur, M. Rodwell, Simulation of Electron Transport in High-Mobility MOSFETs: Density of States Bottleneck and Source Starvation international electron devices meeting. pp. 109- 112 ,(2007) , 10.1109/IEDM.2007.4418876
Donghyun Jin, Daehyun Kim, Taewoo Kim, Jesus A. del Alamo, Quantum capacitance in scaled down III–V FETs international electron devices meeting. pp. 1- 4 ,(2009) , 10.1109/IEDM.2009.5424312
Francisco J. Garcia Ruiz, Andr�s Godoy, Francisco Gamiz, Carlos Sampedro, Luca Donetti, A Comprehensive Study of the Corner Effects in Pi-Gate MOSFETs Including Quantum Effects IEEE Transactions on Electron Devices. ,vol. 54, pp. 3369- 3377 ,(2007) , 10.1109/TED.2007.909206
Isabel M. Tienda-Luna, Francisco J. García Ruiz, Andrés Godoy, Blanca Biel, Francisco Gamiz, Influence of Orientation, Geometry, and Strain on Electron Distribution in Silicon Gate-All-Around (GAA) MOSFETs IEEE Transactions on Electron Devices. ,vol. 58, pp. 3350- 3357 ,(2011) , 10.1109/TED.2011.2162522
Hsin-Hung Shen, Shih-Lun Shen, Chang-Hung Yu, Pin Su, Impact of Quantum Capacitance on Intrinsic Inversion Capacitance Characteristics and Inversion-Charge Loss for Multigate III–V-on-Insulator nMOSFETs IEEE Transactions on Electron Devices. ,vol. 63, pp. 339- 344 ,(2016) , 10.1109/TED.2015.2500915