作者: Ko c , o Canon Kabushiki Kaisha Ishizuka , o Canon Kabushiki Kaisha Isano , Taisuke c
DOI:
关键词: Holographic grating 、 Displacement (vector) 、 Substrate (electronics) 、 Diffraction 、 Optoelectronics 、 Optics 、 Dielectric 、 Surface reflection 、 Materials science 、 Metal 、 Phase grating
摘要: A surface reflection type phase grating 21 in which first metal film 23 is formed on a substrate 22, gratings 24 of rectangular cross-sectional shape having thickness d for first-order diffraction becomes maximum by second material differing from that the thereon, and transparent dielectric 26 SiO2 further surfaces exposed among them, displacement measuring apparatus adopting grating.