Fabrication of high-aspect-ratio platinum probes by two-step electrochemical etching.

作者: Z. Yi , M. Zhang

DOI: 10.1063/1.4928119

关键词: Auxiliary electrodeNanotechnologyVoltageSurface micromachiningFabricationReactive-ion etchingPlatinumElectrochemistryEtching (microfabrication)Materials science

摘要: In this paper, a two-step AC electrochemical etching process was investigated for the fabrication of platinum probes with controllable aspect ratio from 10 to 30, and tip apex radius less than 300 nm. Experiment results show that shape obtained is quite sensitive time first step voltage applied in second step. A graphite crucible used as counter electrode during etching. It proved also play key role realizing high-aspect-ratio probes. The method presented here provides simple way micro-tool construction microstructures, especially 3D micromachining.

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