Activation of shallow dopants in II–VI compounds

作者: W. Walukiewicz

DOI: 10.1016/0022-0248(95)00839-X

关键词: Band gapDopantElectronic band structureChemical physicsTernary operationDopant ActivationMineralogyChemistryFermi levelBand offsetDoping

摘要: Abstract The amphoteric native defect model is applied to the understanding of variations in dopant activation efficiency II–VI compounds. It shown that location common energy reference, Fermi level stabilization energy, relative band edges can be used determine doping induced reduction formation and enhancement concentration compensating defects. most extensively studied compound semiconductors as well ternary quaternary alloys.

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