Investigation of Wafer Level Au-Si Eutectic Bonding of Shape Memory Alloy (SMA) with Silicon

作者: Sobia Bushra

DOI:

关键词: Composite materialBond strengthDiffusion barrierSiliconWaferMaterials scienceAdhesiveSilicon oxideEutectic systemForensic engineeringEutectic bonding

摘要: The objective of this research work was to investigate the low temperature gold silicon eutectic bonding SMA with wafers. carried out optimize a bond process better yield and higher strength. layer thickness, processing temperature, diffusion barrier, adhesive layer, removal oxide are important parameters in determining reliable uniform bond. Based on previous Au-Si bonding, 7 different Si substrates were prepared effect above mentioned parameters. Cantilevers sizes from steel sheets. Afterwards, these cantilevers bonded substrates. strength two which establish quality. Quantitative analysis by shear tests. Scanning Electron Microscopy (SEM) Mapping used for interface elements across has resulted onto wafers high Steel cantilever can also be alloy but sheet is critical. Further needed fabrication stresses interface. It found that amount key factor bonding.

参考文章(31)
D.Y. Sim, T. Kurabayashi, M. Esashi, Bakable Silicon Pneumatic Microvalve Proceedings of the International Solid-State Sensors and Actuators Conference - TRANSDUCERS '95. ,vol. 2, pp. 280- 283 ,(1995) , 10.1109/SENSOR.1995.721800
N. A. Stolwijk, B. Schuster, J. H�lzl, Diffusion of gold in silicon studied by means of neutron-activation analysis and spreading-resistance measurements Applied Physics A. ,vol. 33, pp. 133- 140 ,(1984) , 10.1007/BF00617619
M. Miyashita, T. Tusga, K. Makihara, T. Ohmi, Dependence of Surface Microroughness of CZ, FZ, and EPI Wafers on Wet Chemical Processing Journal of The Electrochemical Society. ,vol. 139, pp. 2133- 2142 ,(1992) , 10.1149/1.2221191
Stefan Bengtsson, Petra Amirfeiz, Room temperature wafer bonding of silicon, oxidized silicon, and crystalline quartz Journal of Electronic Materials. ,vol. 29, pp. 909- 915 ,(2000) , 10.1007/S11664-000-0180-7
Errong Jing, Bin Xiong, Yuelin Wang, Low-temperature Au–Si wafer bonding Journal of Micromechanics and Microengineering. ,vol. 21, pp. 015013- ,(2010) , 10.1088/0960-1317/21/1/015013
T. Suni, K. Henttinen, I. Suni, J. Mäkinen, Effects of Plasma Activation on Hydrophilic Bonding of Si and SiO2 Journal of The Electrochemical Society. ,vol. 149, ,(2002) , 10.1149/1.1477209
Shari N. Farrens, James R. Dekker, Jason K. Smith, Brian E. Roberds, Chemical Free Room Temperature Wafer To Wafer Direct Bonding Journal of The Electrochemical Society. ,vol. 142, pp. 3949- 3955 ,(1995) , 10.1149/1.2048440
R.F. Wolffenbuttel, Low-temperature intermediate Au-Si wafer bonding; eutectic or silicide bond Sensors and Actuators A-physical. ,vol. 62, pp. 680- 686 ,(1997) , 10.1016/S0924-4247(97)01550-1
Q. ‐Y. Tong, G. Kaido, L. Tong, M. Reiche, F. Shi, J. Steinkirchner, T. Y. Tan, U. Gösele, A Simple Chemical Treatment for Preventing Thermal Bubbles in Silicon Wafer Bonding Journal of The Electrochemical Society. ,vol. 142, ,(1995) , 10.1149/1.2050045
S. R. Hah, T. E. Fischer, Tribochemical Polishing of Silicon Nitride Journal of The Electrochemical Society. ,vol. 145, pp. 1708- 1714 ,(1998) , 10.1149/1.1838544