Cleaning/drying apparatus and cleaning/drying method
作者： Chujiro Fukasawa , Mitsuru Kubo , Michinao Nomura
DOI:
关键词: Chemical engineering 、 Chemistry 、 Organic solvent 、 Chromatography
摘要: A cleaning/drying apparatus including a vapor area where of an organic solvent inside the is generated, ejecting part configured to eject onto target, first detecting determine whether temperature target equivalent in area, second enabling condense on surface and control drive when detects that stop ejection temperature.
google.nl 参考文章(34)
Hiromitsu Asano, Tetsuya Tarui, Hajime Onoda, Substrate drying apparatus ,(1995)
Americo Brajal, Antoine Chouly, Sabine Jourdan, Multi-user spread spectrum communication system ,(1994)
Craig Spohr, Philip Schmidt, James C. Lenk, Leslie G. Stanton, Yoshio Iwamoto, Method of calibrating a semiconductor wafer drying apparatus ,(2001)
Israel A. Cimet, Michael D. Kotzin, Valy Lev, Kamala Urs, Multiple frequency allocation radio frequency device and method ,(1999)
Peter S. Chow, John M. Cioffi, Method and apparatus for adaptive, variable bandwidth, high-speed data transmission of a multicarrier signal over digital subscriber lines ,(1993)
Hannu Häkkinen, Kari Pehkonen, Kari Rikkinen, Method and equipment for multirate coding and detection in a multiple access mobile communication system ,(1996)
Kenneth A. Stewart, Michael D. Kotzin, Method and apparatus for reducing self interference in a communication system ,(1995)
Yuen-Yin L. Koo, Ching Yao Huang, Frances Jiang, Enhanced channel allocation among multiple carriers in a spread spectrum communications system ,(2000)
Keijiro Mitsubishi Denki Kabushiki Kaisha Take, A method and apparatus for assigning codes ,(1999)