Method of calibrating a semiconductor wafer drying apparatus
作者： Craig Spohr , Philip Schmidt , James C. Lenk , Leslie G. Stanton , Yoshio Iwamoto
DOI:
关键词: Solvent vapor 、 Electronic engineering 、 Vapor cloud 、 Mechanical engineering 、 Time parameter 、 Materials science 、 Semiconductor 、 Wafer
摘要: A method for calibrating a semiconductor wafer drying apparatus including heater and vessel containing solvent capable of receiving wafers comprises selecting test temperature processing time. first set is placed in the operated at so that vapor cloud created vessel. The monitored substantial envelopment by during Based on monitoring step, least one time adjusted to establish operating parameter an successive sets as promote each dried apparatus.
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