Apparatus and method for drying substrates

摘要: An apparatus for drying substrates such as wafers while contacting IPA vapor with them to remove that solution, which adheres when they are washed, includes a vessel in is stored, unit supplying the into vessel, draining from heater block arranged contactable underside of heat by conduction, boat elevator positioning steam existing space generated heated process solution and water cooling system exchanged between so cool IPA, be drained water.