作者: Tokushi Kizuka , Noboru Mitarai , Nobuo Tanaka
DOI: 10.1007/BF00349953
关键词: Condensed matter physics 、 Electron beam processing 、 Grain boundary 、 Materials science 、 Nanocrystalline material 、 Crystallography 、 Grain growth 、 Nickel aluminide 、 Atomic diffusion 、 Grain size 、 Transmission electron microscopy
摘要: High-resolution transmission electron microscopy was performed on vacuum-deposited nanocrystalline nickel aluminide films. Several ordered structures, i.e. L12(Ni3Al)-, B2(NiAl)-, D513(Ni2Al3)- and D020(NiAl3)-type were observed in the deposited The L12 B2 structures became unstable with decreasing grain sizes. critical size transformation from L12- B2-type into disordered ca. 5 nm at ambient temperatures. High atomic diffusion, sufficient for growth, an increase ordering occurred just above 400°C Ni-Al films structures. diffusion bonding process, temperatures, between nanocrystallites L12-type structure dynamically resolution under strong irradiation. It found that rotated slid without crack generation, neck-growth proceeded even