Deposition and characterization of a novel integrated ZnO nanorods/thin film structure

作者: Ta-Lei Chou , Jyh-Ming Ting

DOI: 10.1016/J.TSF.2005.08.231

关键词: NanorodSurface roughnessScanning electron microscopeCopperChemical engineeringTransmission electron microscopyMineralogySputter depositionThin filmSputteringMaterials science

摘要: Abstract One-dimensional (1-D) ZnO (zinc oxide) nanostructures have received a lot of attention due to their superior properties. Various techniques been developed synthesize nanorods at high-temperature process using vapor–liquid–solid (VLS) mechanism. In this paper, we report novel integrated nanorods/thin film structures an RF magnetron sputter deposition under different parameters and substrate conditions. The used was glass plated with electroless Cu prepared various resulting specimens are analyzed scanning electron microscopy (SEM), transmission (TEM), X-ray diffraction (XRD). effect the copper surface roughness found be significant. were only when layer is rough enough. in general increases plating time and/or ratio V HCHO / bath. Post-plating annealing also increase copper.

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