作者: Misa Hayashida , Tadahiro Kawasaki , Yoshihide Kimura , Yoshizo Takai
DOI: 10.1016/J.NIMB.2006.04.168
关键词: Analytical chemistry 、 Radiation damage 、 Acceleration 、 Resolution (electron density) 、 Optoelectronics 、 Beam diameter 、 Current density 、 Acceleration voltage 、 Transmission electron microscopy 、 Electron diffraction 、 Materials science
摘要: Abstract The decay of the electron diffraction intensity a copper–phthalocyanine crystalline film was quantitatively measured at room temperature by transmission microscopy (TEM) as function current density and beam diameter. measurements revealed that critical dose increases with decreasing density, diameter increasing acceleration voltage. Generally, damage process only depends on dose. However, rise enhances process. relationship between voltage has been measured, result shows an increase in decreases damage. image contrast also using single-wall carbon nanotube (SWNT) radiation-insensitive substitute for order to obtain atomic-level images. results Using these oppositely behaving results, most suitable observing films estimated. show low voltages should be used imaging achieve minimum specimen resolution limit.