Sample processing method and apparatus
作者： Yoshimi Torii , Yoshinao Kawasaki , Yoshiaki Sato , Ryooji Fukuyama , Hironobu Kawahara
DOI:
关键词: Analytical chemistry 、 Plasma 、 Passivation 、 Corrosion 、 Residual 、 Sample (graphics) 、 Sample processing 、 Etching (microfabrication) 、 Materials science 、 Plasma treatment
摘要: A method and apparatus for processing a sample comprises etching the by means (10; 11-14) of an plasma, then treating (20-21) second to remove residual corrosive compounds formed plasma. Removal prevention corrosion is much improved contacting (30, 31) surface after plasma treatment with at least one liquid in order effect (a) removal (b) passivation said exposed steps, drying (41) sample.
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