Oriented Carbon Nanostructures by Plasma Processing: Recent Advances and Future Challenges.
作者： Neelakandan Santhosh , Gregor Filipič , Elena Tatarova , Oleg Baranov , Hiroki Kondo
DOI: 10.3390/MI9110565
关键词: Chemical vapor deposition 、 Materials science 、 Plasma-enhanced chemical vapor deposition 、 Electronics 、 Plasma activation 、 Plasma processing 、 Plasma 、 Carbon 、 Nanotechnology 、 Surface modification
摘要: … This influence of breakdown voltage on gas dissociation is described by Paschen’s law [89]. A Paschen’s curve indicates that the breakdown voltage decreases with decreasing p and d…
mdpi.com
sci-hub.se 参考文章(136)
Yihong Wu, Bingjun Yang, Baoyu Zong, Han Sun, Zexiang Shen, Yuanping Feng, Carbon nanowalls and related materials Journal of Materials Chemistry. ,vol. 14, pp. 469- 477 ,(2004) , 10.1039/B311682D
Nicolas Woehrl, Oliver Ochedowski, Steven Gottlieb, Kosuke Shibasaki, Stephan Schulz, Plasma-enhanced chemical vapor deposition of graphene on copper substrates AIP Advances. ,vol. 4, pp. 047128- ,(2014) , 10.1063/1.4873157
NA Azarenkov, IB Denisenko, KN Ostrikov, None, A model of a large-area planar plasma producer based on surface wave propagation in a plasma-metal structure with a dielectric sheath Journal of Physics D. ,vol. 28, pp. 2465- 2469 ,(1995) , 10.1088/0022-3727/28/12/011
H. Chatei, M. Belmahi, M.B. Assouar, L. Le Brizoual, P. Bourson, J. Bougdira, Growth and characterisation of carbon nanostructures obtained by MPACVD system using CH4/CO2 gas mixture Diamond and Related Materials. ,vol. 15, pp. 1041- 1046 ,(2006) , 10.1016/J.DIAMOND.2005.10.025
Lingbo Zhu, Yonghao Xiu, Jianwen Xu, Prabhakar A. Tamirisa, Dennis W. Hess, Ching-Ping Wong, Superhydrophobicity on two-tier rough surfaces fabricated by controlled growth of aligned carbon nanotube arrays coated with fluorocarbon. Langmuir. ,vol. 21, pp. 11208- 11212 ,(2005) , 10.1021/LA051410+
Jeonghyun Hwang, Moonkyung Kim, Dorr Campbell, Hussain A. Alsalman, Joon Young Kwak, Shriram Shivaraman, Arthur R. Woll, Arunima K. Singh, Richard G. Hennig, Sandeep Gorantla, Mark H. Rümmeli, Michael G. Spencer, van der Waals epitaxial growth of graphene on sapphire by chemical vapor deposition without a metal catalyst. ACS Nano. ,vol. 7, pp. 385- 395 ,(2013) , 10.1021/NN305486X
Shingo Kondo, Shinji Kawai, Wakana Takeuchi, Koji Yamakawa, Shoji Den, Hiroyuki Kano, Mineo Hiramatsu, Masaru Hori, Initial growth process of carbon nanowalls synthesized by radical injection plasma-enhanced chemical vapor deposition Journal of Applied Physics. ,vol. 106, pp. 094302- ,(2009) , 10.1063/1.3253734
Shingo Kondo, Masaru Hori, Koji Yamakawa, Shoji Den, Hiroyuki Kano, Mineo Hiramatsu, Highly reliable growth process of carbon nanowalls using radical injection plasma-enhanced chemical vapor deposition Journal of Vacuum Science & Technology B. ,vol. 26, pp. 1294- 1300 ,(2008) , 10.1116/1.2938397
Takuma Machino, Wakana Takeuchi, Hiroyuki Kano, Mineo Hiramatsu, Masaru Hori, Synthesis of Platinum Nanoparticles on Two-Dimensional Carbon Nanostructures with an Ultrahigh Aspect Ratio Employing Supercritical Fluid Chemical Vapor Deposition Process Applied Physics Express. ,vol. 2, pp. 025001- ,(2009) , 10.1143/APEX.2.025001
Manish Chhowalla, KBK Teo, C Ducati, NL Rupesinghe, GAJ Amaratunga, AC Ferrari, D Roy, J Robertson, a WI Milne, None, Growth process conditions of vertically aligned carbon nanotubes using plasma enhanced chemical vapor deposition Journal of Applied Physics. ,vol. 90, pp. 5308- 5317 ,(2001) , 10.1063/1.1410322