作者: Xiaodong Yang , JB Heroux , MJ Jurkovic , WI Wang , None
DOI: 10.1116/1.591409
关键词: Quantum well 、 Quantum well laser 、 Molecular beam epitaxy 、 Materials science 、 Laser 、 Gallium arsenide 、 Diode 、 Optoelectronics 、 Wide-bandgap semiconductor 、 Slope efficiency
摘要: 1.3 μm InGaAsN:Sb/GaAs quantum well laser diodes (LDs) have been grown by solid source molecular beam epitaxy using Sb as a surfactant. A record low threshold of 1.02 kA/cm2 was achieved for broad area under pulsed operation at room temperature. Performance single (SQW) and multiple (MQW) InGaAsN:Sb LDs are compared. While the temperature slope efficiency MQW remain almost same those SQW LDs, high characteristics greatly improved. operating 105 °C characteristic (T0) 92 K below 75 °C LD.