Ultrafast carrier dynamics in nitrogen-implanted GaAs

作者: S. Sinning , T. Dekorsy , M. Helm

DOI: 10.1049/IP-OPT:20040871

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摘要: The comparative analysis of the ultrafast carrier dynamics pure GaAs and ion-implanted GaNAs is reported. Different nitrogen concentrations (up to 4%) are implanted subsequently annealed by rapid thermal annealing (RTA). Damage channelling Rutherford backscattering (RBS) reveals that step improves crystal quality, but does not restore original quality. From photoreflectance measurements it concluded highest achieved active content in samples 0.5% for an equivalent implantation dose 1%. Carrier investigated one-colour pump-probe covering excitation wavelength range 730–860 nm (1.7–1.44 eV) with femtosecond time resolution. Comparison non-implanted indicates relaxation dominated traps associated damage.

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