Electron beam generated phase zone plates with 30 nm zonewidth for high resolution X-ray microscopy
作者： C David , R Medenwaldt , J Thieme , P Guttmann , D Rudolph
DOI: 10.1088/0150-536X/23/6/006
关键词: Optics 、 Zone plate 、 Germanium 、 Electron-beam lithography 、 Microscopy 、 Diffraction efficiency 、 Materials science 、 Diffraction 、 Silicon 、 Reactive-ion etching
摘要: The authors report the manufacture of germanium phase zone plates as objective lenses for high resolution X-ray imaging at 2.4 nm wavelength. shifting properties can be used to enhance diffraction efficiency a plate. Zone plate patterns with structure widths down 30 are generated by low distortion electron beam lithography. structures transferred into 280 thick layer reactive ion etching (RIE) using highly selective trilevel mask. 100 boron doped silicon windows made from single crystal wafers serve transmission support membranes. Measurements BESSY storage ring proved efficiencies up 6.2%. test object showed clearly resolved features.
harvard.edu
sci-hub.se 参考文章(9)
G. Schneider, B. Niemann, Environmental Chamber for X-Ray Imaging of Wet Biological Specimens X-Ray Microscopy III. pp. 350- 354 ,(1992) , 10.1007/978-3-540-46887-5_80
B.L. Henke, J.C. Davis, E.M. Gullikson, R.C.C. Perera, A Preliminary Report on X-Ray Photoabsorption Coefficients and Atomic Scattering Factors for 92 Elements in the 10-10,000 eV Region Lawrence Berkeley National Laboratory. ,(1988) , 10.2172/919743
D. M. Tennant, High resolution germanium zone plates and apertures for soft x-ray focalometry Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. ,vol. 8, pp. 1970- 1974 ,(1990) , 10.1116/1.584885
Daniel J. Stigliani, Raj Mittra, Richard G. Semonin, Resolving Power of a Zone Plate* Journal of the Optical Society of America. ,vol. 57, pp. 610- 613 ,(1967) , 10.1364/JOSA.57.000610
Y. Vladimirsky, Moiré method and zone plate pattern inaccuracies Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. ,vol. 6, pp. 2142- 2146 ,(1988) , 10.1116/1.584103
C. P. Umbach, A. N. Broers, Proximity effect in electron beam patterned x‐ray masks Applied Physics Letters. ,vol. 56, pp. 1594- 1596 ,(1990) , 10.1063/1.103138
Hans Wolter, Spiegelsysteme streifenden Einfalls als abbildende Optiken für Röntgenstrahlen Annalen der Physik. ,vol. 445, pp. 94- 114 ,(1952) , 10.1002/ANDP.19524450108
Janos Kirz, Phase zone plates for x rays and the extreme uv Journal of the Optical Society of America. ,vol. 64, pp. 301- 309 ,(1974) , 10.1364/JOSA.64.000301
J. Thieme, P. Guttmann, G. Schmahl, G. Schneider, D. Rudolph, C. David, Electron-beam generated x-ray optics for high resolution microscopy studies Optik. ,vol. 91, pp. 95- 99 ,(1992)