Nitrogen dissociation and parametric study in a magnetic pole enhanced inductively coupled Ar-N 2 plasma (MaPE-ICP)

作者: M. Abrar , A.W. Khan , A. Saeed , S. Naseer , A. Qayyum

DOI: 10.1051/EPJAP/2013120324

关键词: Electron temperatureLangmuir probeNitrogenPlasma parametersAnalytical chemistryArgonDissociation (chemistry)ChemistryPlasmaActinometer

摘要: Inductively coupled Ar-N 2 plasma is characterized by Langmuir probe and optical emission spectroscopy (OES). The parameters including electron temperature, number density energy probability functions (EEPFs) are determined the for different discharge such as rf power (10–100 W), filling pressure (0.02–0.4 mbar) argon content (5–95%) in nitrogen discharge. Spectroscopic measurements enable evaluation of active species concentration ([N],[N ]) ground electronic state dissociation fraction. Concentration increased with increase keeping an actinometer. It noticed that actinometry efficient reliable technique to calculate species. Moreover, conditions, molecular fraction enhanced, Ar from 5% 95% found strongly depends on Maximum observed at 0.06 mbar. also significantly depend may be optimized appropriate selection conditions.

参考文章(18)
M. Abrar, G.U. Farwa, S. Naseer, A. Saeed, A.W. Khan, Z. Iqbal, S.T. Hussain, M. Zakaullah, Enhancement of the electrical properties of carbon nanotubes with Ar-N2 plasma treatment Current Applied Physics. ,vol. 13, pp. 567- 575 ,(2013) , 10.1016/J.CAP.2012.10.006
M. Abrar, A. Qayyum, A.R. Gilani, A.W. Khan, A. Saeed, S. Naseer, M. Zakaullah, Effect of helium mixing on excitation temperature and nitrogen dissociation in inductively coupled plasma Current Applied Physics. ,vol. 13, pp. 969- 974 ,(2013) , 10.1016/J.CAP.2013.01.024
Kyoung-Jae Chung, Jae-Myung Choe, Gon-Ho Kim, Y S Hwang, Dynamic sheath expansion in a non-uniform plasma with ion drift Plasma Sources Science and Technology. ,vol. 20, pp. 045014- ,(2011) , 10.1088/0963-0252/20/4/045014
T Meziani, P Colpo, F Rossi, Design of a magnetic-pole enhanced inductively coupled plasma source Plasma Sources Science and Technology. ,vol. 10, pp. 276- 283 ,(2001) , 10.1088/0963-0252/10/2/317
A. Saeed, A.W. Khan, F. Jan, M. Abrar, M. Khalid, M. Zakaullah, Validity of “sputtering and re-condensation” model in active screen cage plasma nitriding process Applied Surface Science. ,vol. 273, pp. 173- 178 ,(2013) , 10.1016/J.APSUSC.2013.02.008