作者: Niyaz Khusnatdinov , Fen Wan , Edward Brian Fletcher , Marlon Menezes , Frank Y. Xu
DOI:
关键词: Nanotechnology 、 Resist 、 Lithography 、 Stencil lithography 、 X-ray lithography 、 Photolithography 、 Substrate (printing) 、 Template 、 Multilayer soft lithography 、 Materials science
摘要: Porous nano-imprint lithography templates may include pores, channels, or porous layers arranged to allow evacuation of gas trapped between a template and substrate. The pores channels be formed by etch other processes. Gaskets on an restrict flow polymerizable material during