Nano-imprint lithography templates

作者: Niyaz Khusnatdinov , Fen Wan , Edward Brian Fletcher , Marlon Menezes , Frank Y. Xu

DOI:

关键词: NanotechnologyResistLithographyStencil lithographyX-ray lithographyPhotolithographySubstrate (printing)TemplateMultilayer soft lithographyMaterials science

摘要: Porous nano-imprint lithography templates may include pores, channels, or porous layers arranged to allow evacuation of gas trapped between a template and substrate. The pores channels be formed by etch other processes. Gaskets on an restrict flow polymerizable material during

参考文章(105)
Raymond Soria, Jacques Gillot, Sophie Cominotti, Organic-inorganic polycondensate and a method of obtaining the same ,(1993)
G. G. Boiko, G. V. Berezhnoi, Migration Paths of Helium in α-Quartz and Vitreous Silica from Molecular Dynamics Data Glass Physics and Chemistry. ,vol. 29, pp. 42- 48 ,(2003) , 10.1023/A:1022357726057
Tae-Woo Jung, Myung-Ok Kim, Sung-Kwon Lee, Sea-Ug Jang, Method for fabricating transistor of semiconductor device ,(2005)
Fen Wan, Edward Brian Fletcher, Frank Y. Xu, Weijun Liu, Gerard M. Schmid, Nano-imprint lithography template fabrication and treatment ,(2009)
Gareth Hougham, Mary Rothwell, Ronald Nunes, Multilayer architechture for microcontact printing stamps ,(2002)
Zoilo Cheng Ho Tan, Photoresist developer and method ,(2000)
David W. Todd, Lauren R. Wendt, Charles Thomas Markantes, Roger W. Phillips, Myra Tan-Johnson, Barrier film having high colorless transparency and method ,(2003)