Fabrication of high-throughput nano-imprint lithography templates
作者： Kosta S. Selinidis , Fen Wan , Edward B. Fletcher , Marlon Menezes , Frank Y. Xu
DOI:
关键词: Refractive index 、 Relative density 、 Silicon 、 Lithography 、 Nanotechnology 、 Template 、 Porosity 、 Fabrication 、 Composite material 、 Nano- 、 Materials science
摘要: An imprint lithography template includes a porous material defining multiplicity of pores with an average pore size at least about 0.4 nm. The silicon and oxygen, ratio Young's modulus (E) to relative density the respect fused silica (pporous/pfused silica) is 10:1. A refractive index between 1.4 1.5. may form intermediate layer or cap template. include seal layer, on top layer.
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